The following table shows a gas mixture matrix for UV excimer lasers.
Mixture |
Wavelength |
Gas Lifetime |
Average Power |
Comments |
|---|---|---|---|---|
F2 |
157nm |
-105 pulses Gas processing required |
<5 watts |
Absorbed by optics and air. Requires vacuum beam deliver. Not recommended for industrial use. |
ArF |
193nm |
-106 pulses Gas processing required |
~ 30 watts |
Requires high-grade optics. Requires purged beam delivery system. Good for low power, high resolution industrial applications. |
KrCl |
222nm |
2 x 106 pulses Gas processing required |
~ 30 watts |
Requires high-grade optics. Absorbed well by some materials. Not commonly used. |
KrF |
248nm |
>107 pulses Gas processing recommended |
50 to 100 watts |
Good optical transmission. Aggressive on materials. Good industrial wavelength. |
XeCl |
308nm |
>20 x 106 pulses Gas processing not required, but can be used |
50 to 100 watts |
Easy on optics. Absorbed well by many materials. Good industrial wavelength |
XeF |
351nm |
-106 pulses Does not respond to gas processing |
<50 watts |
Easy on optics. Not absorbed well by some materials. Not commonly used. |
The following are common industrial gases and wavelengths:
XeCl |
KrF |
Arf |
|---|---|---|
Highest power. Best gas lifetime. Lowest operating costs. Best marking wavelength. |
Aggressive materials interaction. Good power and gas lifetime. Best all around wavelength. Best micromachining wavelength. |
Highest resolution and absorption. |